MOCVD or Metalorganic Chemical Vapor Deposition Process Improvements Through Stable Flow Control, Flow Instrumentation with Fast Response Time, Engineering
Our Flow Instrumentation for Semiconductor Manufacturers Offers Improved Accuracy, Precision, & Repeatability Including Vapor Generation Systems
Semiconductor Manufacturing Using a Coriolis Flow Meter and Controller for Wafer Cleaning, Layer Deposition Processes. Bronkhorst CORI-FLOW and CEM System
Wireless Monitoring and Data Acquisition is Critical for Continuous Operations and Can Prevent Critical Equipment and Process Disruption. Spread Spectrum
SmartRail I/O for Automation Controller, Local Expansion or Remote I/O from Horner Automation with All-in-One EthernetIP, Modbus, Profibus, CANopen, & CsCAN.
Bronkhorst ES-FLOW Series, Ultrasonic Flow Meters for Low Flow Liquids Operates Independent of Liquid Type, Doesn’t Require Calibration Between Liquids.
UL Standards Classification for Industrial Instrumentation Indicates Safety Rating Based on Hazardous Locations Where Using the Instrument is Safe ie HazLoc
Ratio Control for Fuel Streams in Burner and Furnace Operations, Using Flow Meters to Optimize Fuel Delivery and Gas Flow in Combustion. Bronkhorst MASS-STREAM
LVDT Valve Position Measurement Uses NewTek LVDT Position Sensors to Measure Linear Position of Specific Objects. Rugged LVDT with No Moving Parts.
LVDT Position Sensor, Resistant to Vibration, High Temperatures, Pressures. LVDT Offer Infinite Work Life, Have No Moving Parts, Infinite Resolution. NewTek
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