In vacuum deposition equipment, mass flow controllers are useful for the supply of gases. Due to its fast response, Bronkhorst’s newest flexible gas flow controller, is an excellent choice for vacuum deposition processes by reactive sputtering. The FLEXI-FLOW Compact reaches setpoints within 150 milliseconds. Additionally, this flow controller has a large dynamic flow range suitable to control gas flows from 0.5 mln/min up to 20 ln/min. And this capability largely accommodates for the requirements of reactive sputtering.
Reactive sputtering is a layer deposition technique where sputtered particles react with a gas that is introduced to the sputtering chamber. Here, high-energy argon bombards a target, usually a plate of metal such as aluminum. This releases a vapor of sputtered metal particles. Then they react with the supply of reactive gases, typically oxygen or nitrogen. This allows very thin ceramic layers to deposit on glass, silicon wafers, metal, or polymer. So, reactive sputtering is applicable for applying coatings for anti-reflection, hardening, anti-wear, anti-corrosion, etc. Mass flow controllers play a highly relevant role in the supply of gases.
In vacuum deposition technology, fast flow control is essential. Each second saves time and saves energy. Overall, it results in a better efficiency of the deposition equipment. The supply of gas flows require a large dynamic flow range, in a reproducible way, and with long-term stability.
The FLEXI-FLOW mass flow controller reaches 150 msec response time without overshoot. This way, we can meet the requirements of vacuum coating customers that need multichannel flow solutions. The FLEXI-FLOW offers stable and fast flow control in combination with shut-off functionality.
End-users of vacuum deposition equipment require a very fast responding gas supply system. They optimize process conditions like pressure and gas flow. Then, they monitor the result by measuring the coating thickness during the coating process. During the process, there should be a stable, controlled gas flow to keep the coating at the correct thickness and composition.
When the sputter system observes that the thickness or transparency is deviating, it corrects the deposition process by adjusting the gas flows. Therefore, a very fast flow control is necessary, with a response in the 150-millisecond range.
The FLEXI-FLOW mass flow controller can achieve this. In case there are variations in inlet pressure, the gas flow controller keeps the flow at the setpoint as responsive as possible. When there are changes in the reactor chamber, the flow controller receives a new setpoint. This way, fast response to new setpoints results in less waste and less rejected products.
Operates can integrate a shut-off valve to minimize leakage to the vacuum chamber in the phase of vacuuming. This is especially useful in ultra-high vacuum reactors.
The large dynamic flow range with a high turndown ratio of at least 1:1000 reduces the number of models and spare parts needed. And it improves the flexibility of the vacuum deposition equipment.
Compact multi-channel solutions are available with interface of choice through a gateway, making use of industrial protocols like EtherCAT and Profinet. Data produced in this way can be used for predictive maintenance.
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