CEM Evaporator Series, Controlled Evaporator Mixer

• accurate generation and control of vapor (gas / liquid mixtures)
• fast response and high reproducibility
• very stable vapor flow
• flexible selection of gas / liquid ratio
• handles water, solvents, and mixtures
• lower working temperature than conventional bubbler systems

Controlled Evaporator Mixer

Our Controlled Evaporator Mixing (CEM) is a vaporizer and mixer that’s capable of generating highly controllable vapor streams. These systems are useful in a wide range of applications from manufacturing to research purposes. For example, tools (drills, screwdrivers, saw blades, etc.) and machine parts can get coatings to improve their wear resistance using CEM technology.

In addition, CEMs are useful for electric and dielectric (insulating) layer processes to deposit coatings in semiconductor manufacturing. They’re also useful for solar cell manufacturing processes to improve the heat insulation of glazing by applying a coating to its surface. In these applications, precise humidity control in reactor/process chambers ensures optimum performance.

• analyzers with reference gas vapor concentrations toxic gas
• effects on protective clothing
• analyzers with reference H2O vapor concentrations
• anesthetics
• humidification of fuel cells
• crystal breeding installations
• dosage of additives, e.g. perfume, vitamins, etc.

CEM Technology: Controlled Evaporator and Mixing

The CEM a is an integral and innovative part of a whole Vapor Generation System. It’s ideal for either atmospheric or vacuum processes. A full vapor generation system consists of a (thermal or Coriolis) liquid flow controller, a gas mass flow controller (MFC) for carrier gas, and the CEM for temperature control, mixing, and vaporization. These vapor generation systems are suitable for mixing liquid flows of 1-1,200 g/h. As a result, it produces saturated vapor flows of 50 mln/min up to 100 ln/min. These vaporizer systems can replace traditional laboratory glass bubblers to improve process accuracy and repeatability.

To accompany our CEM devices, we have designed a CEM Controller for vapor generation that grants operators ultimate, yet easy, control over vapor generation processes. This controller includes a user-friendly, color touchscreen controller in addition to the CEM itself. It also incorporates at least one liquid and one gas flow meter and controller.

The CEM controller includes high functionality such as totalizing for batching and automatic mode for continuous operation. In addition, the system includes heat tracing to ensure the vapor flow maintains vapor phase throughout the process. Both rack mount and table top models are available. Furthermore, the system is completely customizable to fit process requirements. This CEM controller allows ethernet access, including Modbus, for easy integration to a DCS while also allowing remote access and control.

Common Uses of Vapor Generation Systems

Chemical Vapor Deposition

Chemical Vapor Deposition (CVD) is a chemical process that produces high-purity, high-performance solid materials. The process is ideal for the semiconductor industry to produce thin films for LEDs, transistors and DRAMs. In addition, it’s great for surface treatment applications, hardening processes, and manufacturing of high temperature superconductors. Typically, in a CVD process, the surface (wafer or substrate) is exposed to one or more volatile precursors. These precursors react and/or decompose on the substrate surface to produce the desired deposit.

• ALD (Atomic Layer Deposition) or ALCVD (Atomic Layer CVD): deposits successive layers of different substances to produce layers of crystalline films
• APCVD (Atmospheric pressure CVD): CVD processes at atmospheric pressure
• MOCVD (Metal Organic CVD): CVD processes based on metalorganic precursors
• PECVD (Plasma-Enhanced CVD): CVD processes that utilize a plasma to enhance chemical reaction rates of the precursors

Defined Humidification of Gases

Controlled Evaporator Mixing Systems are ideal suit for the accurate adjustment of dew or moisture. The intrinsic characteristics of large dynamic range and high accuracy ensure accurate control of moisture levels. In addition, it offers great flexibility, from only a few ppm up to virtually 100%, while also maintaining a very high stability in dew point. It also retains full functionality with operating pressures as high as 100 bar.

Calibration of Gas Chromatographs, Mass Spectrometers, and Gas Sensors

Through the combination of Mass Flow Controllers for liquids and the CEM system, gas phase concentrations can be produced as desired. Thus, operators can calibrate Mass Spectrometers or Gas Chromatographs with a reference stream from the CEM. This process is both highly reproducible and highly accurate due to the direct action of the Mass Flow Controllers.

Controlled Evaporation Mixer (CEM) Vaporizer Model Line-Up