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Our vapor generation systems allow easy generation and precise control of vapor streams for a variety of applications. Through its user-friendly, color touchscreen interface, operators can effortlessly modify and control flow rates, setpoints, temperature, downstream heat tracing, stop/start functions, vapor concentration and composition, and more.
This vapor generation system integrates a gas and a liquid flow meter and controller, a Bronkhorst Controlled Evaporation Mixer, and a process controller built in-house. Compared to traditional glass bubblers, generating vapor streams with this technology enables unprecedented control, accuracy, and repeatability while improving ease of operation.
This vapor generation system integrates a gas and a liquid flow meter and controller, a Bronkhorst Controlled Evaporation Mixer, and a process controller built in-house. Compared to traditional glass bubblers, generating vapor streams with this technology enables unprecedented control, accuracy, and repeatability while improving ease of operation.
Our unique and patented Controlled Evaporation Mixing (CEM) technology offers for accurate vapor flow control with analytical tracking. Traditional bubbler systems are often not capable of handling sufficient quantities of liquid with a low vapor pressure and perform in an imperfect way. Moreover, they cannot instantaneously provide vapor of a mixture of liquids with different vapor pressures. Our evaporation technology is fast, accurate, highly repeatable, and efficient.
Our vapor generation systems are available in either table top / desk top models or as a rack-mounted unit. The table top unit can control one CEM system and allows users to easily move and store the vapor generator when not in use. This set up is ideal for research laboratories, universities, and other places where the vapor generation system may not be in constant use and/or where space is limited.
The rack mount system is ideal for manufacturing environments and offers the same easy control. Unlike the table top unit, the rack mount CEM Controller can independently control up to three different vapor generation systems via three separate evaporator mixers and supplemental flow controllers for gases and liquids. In addition, the rack mount vapor generation system can control all three systems as part of a single system.
This vapor generation system is a modular setup with the Controlled Evaporative Mixer (CEM) itself as the core component. A CEM is a mixer and vaporizer that uses heat to atomize a liquid, which is then mixed with a carrier gas. The carrier gas and liquid mixture is then heated and transformed into vapor phase, which can then be used for precise, low flow vapor control. And to feed the CEM with liquid and gas, the CEM is setup with a liquid flow meter with a control function and a gas flow controller. The liquid flow meter also uses the mixing valve of the CEM to control the liquid flow rate.
The gas serves as a mixing component and as a means of transport for the vapor and is therefore known as carrier gas. The mixing valve atomizes the liquid and adds it to the carrier gas, creating an aerosol, which is heated by the CEM until it transforms into a vapor. To monitor the internal temperature of the heat exchanger, the CEM incorporates a PT100 temperature sensor. Additionally, an internal safety switch prevents overheating of the heat exchanger, by interrupting the control signal as soon as the temperature reaches 392˚F.
The gas serves as a mixing component and as a means of transport for the vapor and is therefore known as carrier gas. The mixing valve atomizes the liquid and adds it to the carrier gas, creating an aerosol, which is heated by the CEM until it transforms into a vapor. To monitor the internal temperature of the heat exchanger, the CEM incorporates a PT100 temperature sensor. Additionally, an internal safety switch prevents overheating of the heat exchanger, by interrupting the control signal as soon as the temperature reaches 392˚F.
The Controlled Evaporation System from Process Solutions Corp. offers highly precise vapor generation. It includes liquid and gas flow meters and controllers in addition to a vaporizer (atomizer) and mixing chamber to allow an accurate, repeatable vapor generation process. This vapor generation system is ideal for manufacturing processes such as semiconductors, as well as suitable for laboratory research processes and more. This Vapor Delivery system is an advanced alternative to traditional glass bubblers and is great for batching or continuous production and even offers remote monitoring and data logging capabilities.